Semiconductor Industry Technologists to Debate 45nm Patterning Issues at Applied Materials' Forum During IITC

While new imaging technologies that overcome the resolutionlimitations of conventional exposure tools are being developed,efforts are also underway to extend existing lithography capabilitiesthrough an array of critical patterning and post-print applications.The forum's panel will share their views on what techniques andinnovations can best meet current and future interconnect patterningrequirements.

Panel: Moderated by Dr. Krishna Saraswat, Stanford University
-- Christophe Verove, Crolles2 Alliance
-- Jeff Gambino, IBM Corporation
-- Rudi Cartuyvels, IMEC
-- Douglas Yu, TSMC
-- Jim Ryan, Albany Nanotech
-- Farhad Moghadam, Applied Materials

When/Where:
-- Monday, June 5, 2006
-- Hyatt Regency Hotel, 1333 Bayshore Highway, Burlingame
5:00pm Registration and reception
6:00pm Panel discussion and Q&A

To Register: http://www.appliedmaterials.com/2006_IITC/

Applied Materials, Inc. (Nasdaq:AMAT) is the global leader innanomanufacturing technology(TM) solutions for the electronicsindustry with a broad portfolio of innovative equipment, service andsoftware products. At Applied Materials, we apply nanomanufacturingtechnology to improve the way people live. Learn more atwww.appliedmaterials.com.